JPS-9200 Photoelectron Spectrometer
The JPS-9200 is a newly developed X-ray Photoelectron Spectrometer system used for micro-area surface analysis of a broad range of samples. The new hemispherical electron analyzer incorporates a combination of an electrostatic accelerating lens and magnetic field lens to improve sensitivity 20 times that of previous models. Both monochromatic and non-monochromatic x-ray sources are provided as standard. The minimum x-ray spot size is 30 microns. The ability to map very large areas (50mm x 18mm) is achieved with stage mapping. Using the Total Reflected XPS (TRXPS) mode backgrounds are significantly reduced thus improving the minimum detectability limit. The sample stage provides full automation for smooth and precise positioning. 
 

Imaging NanoESCA
The new NanoESCA System is an Imaging XPS instrument allowing for resolution in the range of 100 nm and below. It consists of a Photo Emission Electron Microscope (PEEM) with a large angular acceptance and an aberration-corrected energy filter. The latter includes a combination of two hemispherical analysers (patent pending). The microscope allows imaging with chemical contrast (Imaging ESCA) by energy filtering of photoelectron images at kinetic energies up to 1.6 keV. As an additional effect, the spatial resolution of the images is enhanced by reduction of the chromatic aberrations, even when using threshold photoemission.

Omni-SPECS Universal XPS
The OMNIpotential SPECtrometer System, OMNI-SPECS, is a modular system, that offers multi-technique capability incorporating a range of facilities for analysis and preparation:  Surface Analysis Chamber (XPS, ESCA, UPS, LEED, AES, ISS, Mass Spectroscopy and Depth Profiling).  The Microscopy Chamber can include: AFM, STM, LEEM, PEEM.  The Sample Preparation Chamber can include:  MBE, PLD, CVD, ALD, PVD, OLED. The system is fully equipped for electronic studies of materials under UHV conditions, including sample manipulation and preparation capabilities. The system consists of two UHV-chambers: a surface analysis and a load-lock chamber.

AXIS Nova
The AXIS Nova incorporates market leading AXIS technology including coaxial charge neutralization, magnetic immersion lens and delay-line photoelectron detection with a new level of automated sample handling in a compact instrument.  The AXIS Nova is ideal for automated QA and problem solving without compromising the ultimate spectroscopic performance required for demanding research applications. The AXIS Nova provides unrivalled performance for fast elemental and chemical state imaging. The spectrometer uses a 165mm mean radius hemispherical analyser (HSA) for spectroscopy combined with the Kratos patented spherical mirror analyser (SMA) for parallel imaging. In spectroscopy mode the large radius HSA ensures excellent photoelectron transmission guaranteeing high sensitivity and high energy resolution.
 

Quantera
PHI's second generation Scanning X-ray Microprobe provides the sensitivity and tools needed to apply XPS surface analysis to a broader range of current and future product development and failure analysis needs. High performance micro-area spectroscopy, XPS depth profiling, automated insulator analysis, and robotic sample handling define a new generation of XPS surface analysis equipment for today's laboratory. Micro area spectroscopy and high performance thin film analysis capabilities open new areas of application for XPS surface analysis in all environments. The complete automation of the system makes it easy to use and increases the reproducibility of routine measurements. Large sample platens make it possible to analyze “real world” large samples or multiple small samples automatically. A new generation of XPS surface analysis instruments is available today from PHI.